A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk: SU-8 process development
SU-8 process development
2012-01-10
Yingtao Tian
2012-01-10
Gary Hillman
2012-01-11
Shay
2012-01-11
Kevin Nichols
2012-01-12
Yingtao Tian
2012-01-11
Yingtao Tian
2012-01-11
Gareth Jenkins
2012-01-12
Yingtao Tian
2012-01-11
Andrew Sarangan
2012-01-12
Yingtao Tian
2012-01-16
Andrew Sarangan
SU-8 process development
Yingtao Tian
2012-01-11
Hi Gary,

What did you mean 'expose the material properly'?

Sorry to mention that the exposure dose is calculated by multiplying the time
and intensity of 10 mJ/cm2. So, my exposure dose ranged from 70 mJ/cm2 to 100
mJ/cm2.

Please comment either the dose is too low or too high.

Thanks,

Yingtao
________________________________________
From: [email protected] [mems-talk-
[email protected]] On Behalf Of Gary Hillman
[[email protected]]
Sent: 10 January 2012 20:35
To: 'General MEMS discussion'
Subject: Re: [mems-talk] SU-8 process development

Sounds like you did not expose the material properly. Gary

reply
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
Mentor Graphics Corporation
Tanner EDA by Mentor Graphics
Process Variations in Microsystems Manufacturing
Harrick Plasma, Inc.