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MEMSnet Home: MEMS-Talk: Sputtered oxide as KOH anisotropic wet etching mask
Sputtered oxide as KOH anisotropic wet etching mask
2012-02-11
JJ HU
2012-02-13
Morrison, Richard H., Jr.
2012-02-13
Kirt Williams
2012-02-13
Ruiz, Marcos Daniel (SGNCOE)
2012-02-13
Tim Eschrich
2012-02-14
Andrew Sarangan
Sputtered oxide as KOH anisotropic wet etching mask
Morrison, Richard H., Jr.
2012-02-13
Sputtered oxide will not work, it is not the same chemically as thermal
oxide.

Rick


-----Original Message-----
From: [email protected]
[mailto:[email protected]] On Behalf Of
JJ HU
Sent: Saturday, February 11, 2012 1:26 PM
To: [email protected]
Subject: [mems-talk] Sputtered oxide as KOH anisotropic wet etching mask

Hello everyone,

I am planning to perform some KOH anisotropic wet etching of silicon to
create V-grooves with ~ 1 um width, and for that I am wondering if I may
use sputtered oxide as the etch mask. I have seen a lot of papers using
thermal oxide but I would like to see if sputtered oxide would work as
well, since I have easy access to a sputtering station. Any advice would
be very much appreciated!

Thank you in advance,
JJ
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