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MEMSnet Home: MEMS-Talk: Sputtered oxide as KOH anisotropic wet etching mask
Sputtered oxide as KOH anisotropic wet etching mask
2012-02-11
JJ HU
2012-02-13
Morrison, Richard H., Jr.
2012-02-13
Kirt Williams
2012-02-13
Ruiz, Marcos Daniel (SGNCOE)
2012-02-13
Tim Eschrich
2012-02-14
Andrew Sarangan
Sputtered oxide as KOH anisotropic wet etching mask
Andrew Sarangan
2012-02-14
For 1um etch, sputtered oxide may last just long enough to make it work.
But you may see pin holes in the masked areas.


On Mon, Feb 13, 2012 at 5:45 PM, Tim Eschrich  wrote:

> Silicon nitride works better with KOH, you should find the etch rate is
> lower for oxide if you use TMAH.
reply
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