Hi
yes you can depending on the etch gas.
I used Aluminum (DC sputtering) as RIE etch stop for silicon oxide
(pecvd), it should work for silicon nitride as well, and use CF4 etch
recipe.
avoid titanium or TiW if using CF4.
avoid using SF6 + oxygen with aluminum

===================================
Salam R. Gabran, MASc.
Research associate, PhD. Candidate
Center for Integrated RF Engineering
(CIRFE Lab)
ECE Dept., University of Waterloo,
200 University Avenue West
Waterloo, Ontario, N2L3G1


On 3/6/2012 12:51 PM, [email protected] wrote:
> Metal Etch Stop (Kipp Schoenwald)
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