Alaedin yes but.  With the correct soft bake, a vacuum soft bake you can remove
the solvent from the first coat which stops intermingling of the first coat with
the second coat when you try to do a second layer of resist.  Best of luck.
Bill Moffat.

-----Original Message-----
From: [email protected] [mailto:mems-
[email protected]] On Behalf Of alaa melhem
Sent: Tuesday, July 17, 2012 4:02 PM
To: General MEMS discussion
Subject: [mems-talk] Photoresist 1822

Hi Everyone,

Is it possible to coat the S 1822 positive photoresist up to 26microns??
I am looking forward to get your help.

Thank you,
Alaeddin
_______________________________________________
Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider
of MEMS and Nanotechnology design and fabrication services.
Visit us at http://www.mems-exchange.org

Want to advertise to this community?  See http://www.memsnet.org

To unsubscribe:
http://mail.mems-exchange.org/mailman/listinfo/mems-talk
_______________________________________________
Hosted by the MEMS and Nanotechnology Exchange, the country's leading
provider of MEMS and Nanotechnology design and fabrication services.
Visit us at http://www.mems-exchange.org

Want to advertise to this community?  See http://www.memsnet.org

To unsubscribe:
http://mail.mems-exchange.org/mailman/listinfo/mems-talk