I've used ebeam evaporation on photoresist to pattern metal for lift-off. Slow
dep rates are needed to not burn the resist.
Dan
-----Original Message-----
From: [email protected] [mailto:mems-talk-
[email protected]] On Behalf Of Yingtao Tian
Sent: Thursday, August 23, 2012 10:48 AM
To: General MEMS discussion
Subject: Re: [mems-talk] Thin film deposition at room temperature
Hi Alex,
Sorry forgot to say, the substrate is photoresist. So, I cannot use any plasma
or heat evaporation.
Thanks,
Yingtao
-----Original Message-----
From: [email protected] [mailto:mems-talk-
[email protected]] On Behalf Of Alex Mellnik
Sent: 23 August 2012 18:23
To: General MEMS discussion
Subject: Re: [mems-talk] Thin film deposition at room temperature
What's under the film? If it's not sensitive to oxygen plasmas you can
evaporate carbon and then ash it off.
-Alex
On Thu, Aug 23, 2012 at 11:11 AM, Yingtao Tian wrote:
> Hi All,
>
> I am trying to get round of how to put a thin film down at room temperature. I
need a localised thin film with following properties:
>
> 1. non-transparent
> 2. as thin as possible - say in the order of few microns 3. easy to
> remove 4. can be applied at around room temperature
>
> I am thinking of some possible spray, but have not got any clue. I would
appreciate if you have some interesting idea about it.
>
>
> Thanks a lot.
>
> Regards,
> Yingtao
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Want to advertise to this community? See http://www.memsnet.org
To unsubscribe:
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_______________________________________________
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