After post exposure bake, still no darkening, but after developing, darkening
occurs. After seeing the profile using SEM, the profile is not straight. I soft
bake it at 65C for about 9mins, 95C at 120C for post exposé bake.  Or does it
require higher soft bake temperature for this photoresists?
Thank you.

Best Regards,
Siew Mun

Sent from my iPhone

On 18 Jan, 2013, at 10:24, Gareth Jenkins  wrote:

> Deep UV or heating of the wafer may also cause the problem. When does the
> darkening occur? (Is it immediately visible after exposure or at some other
> point in the process)? Do your structures look overexposed after
> development?
>
>
> On 17 January 2013 11:11, Jocelyn Ng  wrote:
>
>> Hello,
>>
>> I'm doing single layer SU8 2005, thickness ~6-7um. I use 60mJ/cm^-2 on
>> sputtered gold surface. But somehow sometimes I notice that the edges of my
>> pattern darkens, I suspect it's due to overexposed. But 60mJ is quite a low
>> dose compared to the recommended one. I would appreciate any comments
>> given. Thank you.
>>
>> Best Regards,
>> Jocelyn
>>
>> Sent from my iPhone
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