Hi All-
I'm trying to spincoat 2% HSQ (@3krpm) over an ultrathin silicon
nitride membrane for e-beam patterning. What I see is:
1. nonuniform spreading of HSQ
2. consequently the pattern is defined in the areas where HSQ is thicker
I try oxygen plasma ashing before the spin, but it doesn't help much.
Any ideas?
Thanks,
-Lukasz
PS HSQ is ~4 months after expiration date
_______________________________________________
Hosted by the MEMS and Nanotechnology Exchange, the country's leading
provider of MEMS and Nanotechnology design and fabrication services.
Visit us at http://www.mems-exchange.org

Want to advertise to this community?  See http://www.memsnet.org

To unsubscribe:
http://mail.mems-exchange.org/mailman/listinfo/mems-talk