Hello everyone,

I am trying to find a high viscosity material that can fill pores (<100nm)
of a substrate, then do patterning with photoresist on it, and removed this
material with some solvent or even DI water, but not affecting the
photoresist patterns.

We have tried several materials for now, but didn't work very well, do you
have any ideas of this material? Thank you!

Best regards,
Xiao
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