Daniel:
At this time we have only run fluorocarbon films using C4F8 in our reactor.
The water contact angle was 105 degrees and I don't know what the hysteresis
was. We are looking to partner with groups to complete the SiOx + C-F work
looking toward building a larger production type system. Currently we can
run up to 8" x 8" samples. Can you discuss what your application is?
Substrate being treated? Bob Henderson
-----Original Message-----
From: [email protected]
[mailto:[email protected]] On
Behalf Of Daniel Figura
Sent: Monday, June 10, 2013 3:10 AM
To: 'General MEMS discussion'
Subject: Re: [mems-talk] Super hydrophobic films in a new PECVD reactor
Hello Bob,
what is the hysteresis of water contact angle on the surface? What size of
samples can you make (6"x6")?
Thank you.
With best regards,
Daniel
Daniel Figura
smartfabgroupT Company
process consulting . data processing . fab software
Phone: +421 944 45 26 86
E-mail: [email protected], Web: www.smartfabgroup.com
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-----Original Message-----
From: [email protected]
[mailto:[email protected]] On
Behalf Of Bob Henderson
Sent: Friday, June 07, 2013 00:53
To: [email protected]
Subject: [mems-talk] Super hydrophobic films in a new PECVD reactor
Is there anyone within the MEMS community that is looking for a film
composed of a silicon oxide and fluorocarbon sandwich which produces a
hydrophobicity with a contact angle >150 degrees. In particular would this
type film be useful for micro fluidic channels as a barrier or to increase
flow rates in small openings? Bob Henderson
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