I'm working on microfluidics and think I can use PDMS castings
directly on my photoresist for square channels, but the resist looks
like swiss-cheese up close when it's defocused to create a curved
profile, so I think my only option is to pattern then isotropic etch,
ash/wash away resist, then cast with PDMS.

Seems that HF based solutions are my only google hits...I've used HF
once or twice before and the local lab I plan on working in has HF
already, but I remember being pretty wary of the HF. I occasionally
bump or spill things, not /that/ often, but I'd rather play with safer
chems if possible. I guess driving my car might be more dangerous
statistically, but I feel there's a little more wiggle room in
something like driving!

Anyway, any recommendations would be great. I don't have any process
setup yet so I'm flexible.

--
-Nathan
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