David not clear on your question. If you are trying to create a resist profile
that has vertical lines image reversal can do this.  Using the flood exposure it
is possible to go from a negative resist angle of 22 degrees, through vertical
to a positive 22 degrees in controllable stages. Contact me at YES for free
trials.  Bill Moffat 925 373 8353.

Sent from my iPad

On Sep 20, 2013, at 7:22 AM, "Nathan McCorkle"  wrote:

> I'm working on microfluidics and think I can use PDMS castings
> directly on my photoresist for square channels, but the resist looks
> like swiss-cheese up close when it's defocused to create a curved
> profile, so I think my only option is to pattern then isotropic etch,
> ash/wash away resist, then cast with PDMS.
>
> Seems that HF based solutions are my only google hits...I've used HF
> once or twice before and the local lab I plan on working in has HF
> already, but I remember being pretty wary of the HF. I occasionally
> bump or spill things, not /that/ often, but I'd rather play with safer
> chems if possible. I guess driving my car might be more dangerous
> statistically, but I feel there's a little more wiggle room in
> something like driving!
>
> Anyway, any recommendations would be great. I don't have any process
> setup yet so I'm flexible.
>
> --
> -Nathan
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