It would be useful if you can describe what problems you are
encountering with the process.

On Mon, Jan 13, 2014 at 3:16 PM, Haider, Ahmad M  wrote:
> Hi,
>
> I am using Shipley 1827 resist for photolithography. Till now, I always have a
pre step in which I spin p20 primer onto the wafer and then I spin the 1827
resist onto the wafer. I am facing certain problems with this. Can I just spin
1827 on a clean wafer directly? Can I get some help with the process parameters?
>
> Thanks
> Ahmad
> _______________________________________________
> Hosted by the MEMS and Nanotechnology Exchange, the country's leading
> provider of MEMS and Nanotechnology design and fabrication services.
> Visit us at http://www.mems-exchange.org
>
> Want to advertise to this community?  See http://www.memsnet.org
>
> To unsubscribe:
> http://mail.mems-exchange.org/mailman/listinfo/mems-talk
_______________________________________________
Hosted by the MEMS and Nanotechnology Exchange, the country's leading
provider of MEMS and Nanotechnology design and fabrication services.
Visit us at http://www.mems-exchange.org

Want to advertise to this community?  See http://www.memsnet.org

To unsubscribe:
http://mail.mems-exchange.org/mailman/listinfo/mems-talk