Hi.

at first, I want you to understand that I don't know english very well.


I want to form center holes on Ni membrane.

diameter of membrane is 3~400um(thickness 2um) and of center hole is 2~30um.

I want to form 5 center holes.

So I thought two methods.


1. Using lift-off process, center holes is formed without etching process.
2. after deposition Ni thin film,  etching process is progressed for forming
center holes.


I want to know which is more efficient.
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