Hello Janis,

I had the same kind of problem with Su-8 and glass. First of all, SU-8 has
a poor adherence on glass (prefer silicon when possible). The, adhesion
problem are often linked with substrate cleanliness. Before coating the
resist bake the substrate  at 120-140°C for some minutes to the desorption
of H2O.
You can also use adhesion promotors (like HMDS for silicon) in order to
increase the adhesion of the SU8 on glass , for glass or oxide  the AP300
promotor seems to work.
In my case, I finally decided to move from glass to silicon, because
adhesion and cracks of the SU-8 were a big issue on glass. But that also
depend on the thickness of your SU-8 layer, on your protocol etc.
First, to improve adhesion you can try to  ramp up and down all the baking
steps (starting from room tempature for example). This reduces the stress
of the SU-8 and thus the lifting of the patterns. You can also try to
increase the exposure dose.





Hope this helps.

Sophie Roman

Stanford University


2014-03-10 7:51 GMT-07:00 Janis Klavins :

> Hello everybody,
>
> I am trying to coat an SU8 material on ITO etched glass. I have a problem
> that during development the SU8 lifts off the glass very easily. if the
> glass sheet is immersed in the developer the SU8 lifts off and floats away.
>
> I believe that this is a baking problem (too much or not enough) after
> coating the SU8. I am using a two step kiln 65 degrees ( 1 min)  and 95
> degrees (4 min). The same settings for post exposure bake.
>
> Has anyone seen a problem like this?
>
> --
> Best regards,
> Mr. Janis Klavins
> EuroLCDs
> Phone: +37163600300
> Mobile: +37126141049
>
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