Are you sure the SU-8 is getting sufficiently exposed.  I have had adhesion
issues when SU-8 resist hasn't received a long enough exposure.  Exposure
dose is dependent on substrate.


On Tue, Mar 11, 2014 at 11:05 AM, Bill Moffat
wrote:

> Hi Bill
> His problem is most likely underbaking. SU8 process recommendations are
> specific.  Hot plate is recommended, not kiln. If what he means by kiln is
> an oven, he is probably forming a skin and trapping solvents and not baking
> enough to get them out.
>
> As far as an adhesion promoter that he probably doesn't need, APTES or
> GOPS would do. It's epoxy resist, so either epoxy to meld our amine to
> bind....
> Janis input from Ken Sautter our senior Process Engineer.  Additional
> thoughts, adhesion to ITO has always been difficult. I quote Grant Wilson a
> true resist guru, "we have always had problems with adhesion to ITO".  This
> has been solved partially by treatment with OCTS and totally with treatment
> with vapor OCTS.  This is unfortunately with standard positive resist. It
> may need APTES or GOPS for adhesion to SU8.  Bill Moffat
>
> -----Original Message-----
> From: [email protected] [mailto:
> [email protected]] On Behalf Of
> Janis Klavins
> Sent: Monday, March 10, 2014 7:51 AM
> To: General MEMS discussion
> Subject: [mems-talk] SU8 adhesion problems
>
> Hello everybody,
>
> I am trying to coat an SU8 material on ITO etched glass. I have a problem
> that during development the SU8 lifts off the glass very easily.
> if the glass sheet is immersed in the developer the SU8 lifts off and
> floats away.
>
> I believe that this is a baking problem (too much or not enough) after
> coating the SU8. I am using a two step kiln 65 degrees ( 1 min)  and 95
> degrees (4 min). The same settings for post exposure bake.
>
> Has anyone seen a problem like this?
>
> --
> Best regards,
> Mr. Janis Klavins
> EuroLCDs
> Phone: +37163600300
> Mobile: +37126141049
>
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