Hi Ryan,
   We've a very nice recipe for our Trion ICP/RIE metal etcher.
              CHF3: 47 sccm
               Ar: 3 sccm (yes, argon.)
               Pressure: ~50 mT (though not 100% on this)
               ICP power: 300W
               Platen: 50W
This recipe etched 400nm in 1180 sec.
Cheers,
  Michael
________________________________________
From: [email protected] [mems-talk-
[email protected]] on behalf of Ryan
[[email protected]]
Sent: Monday, May 19, 2014 1:32 AM
To: [email protected]
Subject: [mems-talk] Best recipe to etch sio2 using CHF3 gas with ULVAC NE-550

Hi.

I am wondering what is the best recipe for etching Sio2 using CHF3 gas with
NE-550 ULVAC?

I do not have any knowledge or data for that.

If possible, could anyone please leave any method with gas and power or
something with care?

Thanks

Ryan

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