Replace CF4 to SF6...

Sergey Afanasyev,
Mizur, Israel


2014-07-24 2:29 GMT+03:00 Andrew Sarangan :

> If the film looks grey or black, then it is most likely carbon from CF4.
>
>
> On Wed, Jul 23, 2014 at 11:00 AM, Sebastian R Freeman
>  wrote:
> > Hi everyone,
> >
> > I am etching a 4-inch silicon wafer in the RIE using O2, and CF4, in
> > combination. Using positive photoresist, my goal is to create an array of
> > silicon pillars covering the surface of the wafer. I am trying to push
> the
> > limits of the machine, and trying to etch several microns. I etched for 5
> > minutes and was able to get 1.5 micron tall pillars, the wafer came out
> of
> > the machine very dirty, with a film-like residue on it, and looking very
> > scratched up. I think I might have an idea of what this is, but I would
> > appreciate anyone else's input, or a way to prevent it.
> >
> > *Sebastian Freeman*
> > *Ph.D Student*
> >
> > *Binghamton University *
> >
> > *Thomas J. Watson School of Engineering*
> > *Department of Bioengineering*
> > *Office: Biotechnology Building 2629*
> > *E-mail: [email protected] *
> > _______________________________________________
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> Hosted by the MEMS and Nanotechnology Exchange, the country's leading
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_______________________________________________
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Visit us at http://www.mems-exchange.org

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