Hello everybody,

A few weeks ago Dimitar  posed an interesting question about issues exposing
and SU8 with uncollimated lamp and that started me thinking about limits of
such approach. Few days later I was myself in theoretical discussion about
using uncollimated lamp as a light source for lithographic exposures. I
believe that the main limitation is geometrical light travel path; that you
basically expose parts of the substrate under severe angle which blurs your
image, but I might be wrong.

Does anyone of you is using uncollimated light source for contact/proximity
exposure? What is the configuration you use (size of lamp, distance, resist
thickness) and results do you achieve?

Thanks for the answers.

With best regards,

Daniel


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