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News	MEMSnet Home: MEMS-Talk: About difficulty in photoresist development (if using HMDS as adhesion layer) About difficulty in photoresist development (if using HMDS as adhesion layer) 2015-09-23 Mehmet Yilmaz About difficulty in photoresist development (if using HMDS as adhesion layer) 2015-09-24 Bill Moffat About difficulty in photoresist development (if using HMDS as adhesion layer) 2015-09-24 André Bödecker About difficulty in photoresist development (if using HMDS as adhesion layer) 2015-09-24 James Guenes 2015-09-25 Liang Zhao 2015-09-25 Orozaliev Ajymurat Nurdinovich 2015-09-29 Mehmet Yilmaz About difficulty in photoresist development (if using HMDS as adhesion layer) 2015-09-25 Mohammad Yusuf Mulla About difficulty in photoresist development (if using HMDS as adhesion layer) 2015-09-29 Andrew Sarangan 2015-09-30 Mehmet Yilmaz 2015-10-04 Andrew Sarangan 2016-01-04 Mehmet Yilmaz 2016-01-04 조명래 2016-01-04 ozgur celik 2016-01-05 André Bödecker 2015-09-25 Brian Baker About difficulty in photoresist development (if using HMDS as adhesion layer) Brian Baker 2015-09-25 Mehmet, It sounds like you may be using undiluted HMDS which can react with your photoresist and render it undevelopable. We usually dilute our HMDS with Xylene (80:20 Xylene: HMDS) before the dispense/spin cycle. A 3000 rpm, 60 second spin cycle with the diluted HMDS should leave a layer that will improve adhesion without affecting the photoresist that is subsequently spin-coated. Best, Brian Baker Utah Nanofab _______________________________________________ Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider of MEMS and Nanotechnology design and fabrication services. Visit us at http://www.mems-exchange.org Want to advertise to this community? See http://www.memsnet.org To unsubscribe: http://mail.mems-exchange.org/mailman/listinfo/mems-talk reply
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