AZ5214E photoresist adhesion problem on Al2O3 coated Si wafers
Sales
2016-06-15
SurPass adhesion promoters from Transene can improve resist adhesion on ceramic.
Alternatively, PKP photoresist would be more resistant.
http://transene.com/pkp/
Chris Christuk
Transene
-----Original Message-----
From: [email protected] [mailto:mems-talk-
[email protected]] On Behalf Of Maksym Plakhotnyuk
Sent: Wednesday, June 08, 2016 1:44 PM
To: [email protected]
Subject: [mems-talk] AZ5214E photoresist adhesion problem on Al2O3 coated Si
wafers
Hi All
I face a problem of keeping AZ5214e photoresist on top of Al2O3 film during BHF
etch.
I have done post bake of PR at 150C for 30 min however it still does not help.
Does any of you know the solution or any idea how to keep PR On top of alumina
during BHF etch?
Thank you in advance
Best regards
Maksym Plakhotnyuk
PHD student at DTU
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_______________________________________________
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provider of MEMS and Nanotechnology design and fabrication services.
Visit us at http://www.mems-exchange.org
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