You can easily sputter a grating structure via liftoff with micron sized
features. See my article http://nanolithography.spiedigitallibrary.org/mobile/ar
ticle.aspx?articleid=2092198

Good luck,

Thomas Wilson

Sent from my iPhone

> On Jul 7, 2016, at 11:05 AM, Philipp Altpeter  wrote:
>
> Lift-off with a sputtered metal layer doesn't sound feasible to me.
> Evaporation and lift-off would work in principle, but since your
> substrate is huge (and therefore the evaporator) I would recommend to
> sputter Al ontop of the glass substrate, then you define the grid
> lithographically by means of a laser (fixed beam moving stage). And
> finally you develope the photoresist and etch the Al layer both in an
> alkaline developer.
>
> Best regards,
>
> Philipp
>
>
>
>> Am 29.06.2016 um 02:56 schrieb John Bohland:
>> I am interested in making a metal grid on a 370 mm X 470 mm glass substrate.
>>
>> The problem is that the metallization lines must be only 1.5 microns in width
and spaced (pitch) only a few microns apart.
>>
>> The metal can be Al or Ag and 100 nm thick.
>>
>> The best idea I have is to monolithically coat the glass with sputtered (PVD)
Al or Ag then use a picoseond laser to remove all but the desired 1.5 micron
wide metal line widths. Even then I don't know if the laser would have good
enough resolution to meet these requirements.
>>
>> Anyone have better ideas?
>>
>> Thanks,
>>
>> John
>>
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> --
> Philipp Altpeter
> Fakultät für Physik der Ludwig-Maximilians-Universität und
> Center for NanoScience (CeNS)
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