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MEMSnet Home: MEMS-Talk: Developing high Aspect Ratio SU8 Photoresist
Developing high Aspect Ratio SU8 Photoresist
2001-07-28
[email protected]
Developing high Aspect Ratio SU8 Photoresist
[email protected]
2001-07-28
Hi everybody,

We are building SU8 molds that are 100 - 300 micron high on 6 in wafers,
these molds have features as small as 5 micron, and that makes them
difficult to rsolve in imaging and developing. We are using MicroChem
SU8 developer.

If you are working on the same/similar subject, I need your input on your
prefered development method:

1) Using a beaker where developer is stirred while the wafer is suspended
    upside down, or
2) Using a machine where the wafer is spinning while the developer is showered
    on it, then recollected and recycled.

If you use the second approach, please mention the model #, manufacturer name,
address, E-mail, or Tel. #

Thanks,

Salah Feteih
Senior Research Scientist,
FANUC Berkeley Lab.



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