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MEMSnet Home: MEMS-Talk: Re: In-situ Boron doping of polysilicon
Re: In-situ Boron doping of polysilicon
1999-02-02
Jonathan Bernstein
1999-02-03
SEED
1999-02-02
Lynn Rathbun
Re: In-situ Boron doping of polysilicon
SEED
1999-02-03
-----­ì©l¶l¥ó-----
±H¥óªÌ: Matt Wilcox 
¦¬¥óªÌ: [email protected] 
¤é´Á: 1999¦~2¤ë2¤é PM 02:12
¥D¦®: In-situ Boron doping of polysilicon


Dear Wilcox,
    Borane (B2H6) can be used to dope polysilicon in-situ with silane.
            B2H6 + 3O2 = B2O3 + 3H2O
It should be noted that borane is extremely poisonous and explosive as well
as silane; consequently, large amout of argon must be added for dilution.
However, the doping amount is not easily controlled because of the
segregation effect of SiO2. Maybe you could use CO2 to displace O2 if you do
not care carbon contamination.
            B2H6 + 6CO2 = B2O3 + 6CO + 3H2O

                                                    Chao-Chen Cheng, EE
dept.
                             in National Chao Tung University, Hsinchu
Taiwan


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