Dear researchers,

I am currently trying to form pyramids on silicon wafers for use in the
manufacture of solar cells (texturing).  My process at the moment
involves a dip in concentrated KOH followed by immersion in a 10% KOH
solution containing isopropanol. While this works ocasionally It often
doesn't and I was wondering if anyone can help me with making the
methind more reliable.

Any information on the anisotropic etching of silicon would also be
appreciated, particularly on the chemistry of the whole procedure.

Thanks in advance,

James Cotsell