RE: Ion Milling as an Alternative to Wet/Dry Etching of Aluminum
Sanjay Dhar
1999-02-19
Ion Milling is used as a standard production process in the magnetic thin
film head industry.
Don't have any references or such...but ion mill vendors would be more than
happy to give you info.
sanjay
> ----------
> From: [email protected][SMTP:[email protected]]
> Reply To: [email protected];[email protected]
> Sent: Friday, February 19, 1999 9:39 AM
> To: [email protected]
> Subject: Ion Milling as an Alternative to Wet/Dry Etching of Aluminum
>
> Hello everyone,
>
> I'm currently working on process development for a multilayer
> microwave integrated circuit. My final metallization layer is
> aluminum, and I would like to minimize undercutting, so I am
> considering a Barium Chloride type of dry etching procedure,
>
> However, I recently learned about the ion-milling technique. It
> claims
> to have virtually no undercut, and high yields. A careful choice of
> photoresist must be made as the process generates much heat.
>
> Anyone have any experience with ion milling? I would appreciate a
> list
> of references, and some advice as to if this process is suitable for
> microwave integrated circuits. I've already consulted the Jan '85
> paper from Microwaves and RF.
>
> Thanks in advance,
>
> Avinash Kane
> Raytheon Systems Company
> Solid State Microwave
> Fullerton, California
> [email protected]
>
>
>