Hi all:
I am looking for a way to chemically etch Cu (or Ag) deposited onto
a very thin alumina film (~10 nm) obtained by oxidation in air of a
sputtered Al film.
You understand that the alumina layer should absolutely not be
etched by the etching solution for Cu or Ag. I was thinking of
cyanides, but I have some concerns about the safety. I also don't
know what the laws are about the use of cyanides in the US.
Thanks to all of you,
Giovanni
===================================================
Dr. Giovanni ZANGARI
Assistant Professor
Dept. of Metallurgical and Materials Engineering
University of Alabama
P.O. Box 870202, 120 Bevill Building
Tuscaloosa, AL 35487
Phone: (205) 348-7074
Fax: (205) 348-2164
e-mail: [email protected]
