On Thu, 13 May 1999, Marc A. Unger wrote:

> The mold can be made in less than a day, but the mask (for the
> photolithography) still takes time (a few days).  If there is a printer
> than can print ~10 um high lines, that would obviously a lot faster.  And
> why not prototype as fast as possible?
>
> We are already investigating the use of thick resist.  Anyone happen to
> know a set of conditions for patterning an AZ type resist at 10-20 microns
> thick?

Using Hoechst's AZ4562, we get 12 micron patterns with the following
conditions:

-80" spinning at 1000 rpm
-30' softbake at 100C
-90" illumination at 5 mW/cm2
-developing using AZ531 developer
-hardbake


Dirk De Bruyker

K.U.Leuven, Dept. Esat-Micas
Kard. Mercierlaan 94, B-3001 Leuven, Belgium
Tel: +32 16 32 1700      Fax: +32 16 32 1975
E-mail:   [email protected]
http://www.esat.kuleuven.ac.be/~debruyke