KMER resist

Hello Colleagues:

I wanted to thank everyone out there who responded to my question about
patterning of Silicon Nitride.  A lot of you have asked for any
information that I get from the MEMS community about this question.
Attached please find the original question that I asked and various
replies that I received.

I also wanted to point out the book where I found that Silicon Nitride
can be etched using sodium hydroxide solution.  The Title of the book
is "Handbook of Metal Etchants" by Perrin Walker and William H. Tarn
from CRC Press.  ISBN 0-8493-3623-6

The recipe as they have written is as follows :
"NaOH :90 g
H2O :250 ml
Temperature: boiling
Rate of etching :180 A/min
Resist used : KMER

Glycerin or etylene glycol can be added for additional rate control."
Some other good references that this book points out are as follows :
· Wurzbach, J A & Grunthaner, F J --- J of Appl Physics, 130, 690
(1983)
· Hess, D W ---J of Vac Sci Technology, A(2), 243, (1984)
· Kurtz, F et al ---- J of Electrochemical Society, 113, 1452 (1966)