My company Faraday Foresight Ltd through its SMIDGEN Consortium cab arrange
access to the new CFD Design Centre at the Daresbury Laboratory.  Please
contact me if you are interested and go to SMIDGEN on our website.  You
should know that The Nanotechnology Centre at Birmingham is a member of
SMIDGEN.
website http://faradayforesight.co.uk

Dave Tolfree

-----Original Message-----
From: Carlos Gallegos [mailto:[email protected]]
Sent: 06 May 1999 5:37 PM
To: [email protected]
Subject: Re: Fwd: Modelling of MEMS


>Hi!

>

>I am a student from the University of Birmingham and would like to
find

>out

>what are the modelling techniques available for MEMS? Please assist.

>

>Thank you very much.

>

>Regards,

>C H WONG

>



Dear C H Wong,


There are a number of modeling techniques available for MEMS. These
can be broken down into process simulation, device solid modeling, and
device simulation, and layout editors.


Some process simulators include:

Tools such as SUPREM from Stanford University which models such
processes as  diffusion and oxidation and AnisE made by IntelliSense
which simulates anisotropic etching.


IntelliSense also produces a module which produces 3D solid models
based on the fabrication process.


In terms of device simulation, there are a vast number of simulators
available.  These include, but are not limited to


electromechanical simulators,

fluidic simulators,

electromagnetic simulators,

and system level simulators.


In terms of layout editors for generating masks, there are quite a few
available.  IntelliSuite by IntelliCAD has it's own mask editor.  Many
people also use Cadence or AutoCad for mask generation.


IntelliSuite, which is produced by IntelliSense provides a general
framework which links many of the above process together.  Users can
move from process simulation, to device solid modeling (Including mask
layout), to  device performance simulation all in one environment.


You can visit our website for more information:
http://www.intellisense.com


I would definitely be interested in any other information you compile.


Sincerely,

Carlos Gallegos