Hi, All,

I have metal layer (Cr 300A, Au 1200A), the patterns are 1um features with
1um spaces. I use ion mill to etch the metal with PR (897-12i) as the mask.
After the etching, it is hard to clean the PR ( I use hot 1165 remover).
There are residual attached on the pattern edge.
Any suggestion is highly appreciated. Thanks in advance.

Yahong
-----------------------
Yahong Yao
NYS Center for Advanced
Thin Film Technology
CESTM, Room L245
251 Fuller Road
Albany, NY 12203
______________________________________________________
Get Your Private, Free Email at http://www.hotmail.com