Dear colleagues,

for silicon pressure-sensors, we have to fabricate thin silicon membranes
with a reproducible thickness. We are looking for equipment for
KOH- or TMAH-etching using the electrochemical etch-stop, i. e.:
1) a small potentiostat for biasing
2) a wafer-holder, that protects the backside from the etchant

For both we would like to find a solution that has proven to work well in
a lab or fab. Are there any systems out on the market that provide a
certain degree of automation?

Thank you in advance for your help!

Best regards,

Karim Sultan

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Kirchhoff-Institut fuer Physik
Universitaet Heidelberg
Deutschland / Germany