Aluminum fluoride is non volatile..would stop the etch process after a
top layer is formed.  aluminum chloride is volatile and the etch would
continue..

Madan



> Hi guys,
>
> why chlorine based chemistry is preferred over lets say fluorine to etch
> Al in plasma etch (RIE type)?
>
> any help would be useful.
>
> thanks
>
> Jay Mirza
>
>
>

Madan/K.V.Madanagopal             http://www.ee.cornell.edu/~madan
Grad. Student, EE dept.           phone:607-255-4041 (off), 266-8709 (res)
116 philips hall, Cornell Univ.   fax:  607-255-8601