> I am facing difficulty of depositing 1 micron thick Al on glass capillary of
> 80  micron diameter. In order to get good uniformity, I need to rotate it. I
> have hard time to calculate the deposition rate. I am using e-beam
evaporation.
It sounds as if you are not using a crystal monitor. With a monitor and a
controller, you should be able keep your rate uniform to better than a few
percent.

> Do you think sputtering will be better? Rotation control is also a big
problem.
If by rotation control you mean keeping a constant rotation speed, then you
will have problems with uniformity regardless of your deposition method. How
are you rotating your capillary? A synchronous motor ought to give a speed
constant to much more than you need.

How fast is your deposition rate? It should be slow enough that the capillary
makes many (hundreds or thousands) rotations in the course of the deposition.

> Any idea of how to do this process is highly appreciated. Thanks a lot.
>
Does the metal have to be aluminum? If it can be something like nickel, copper
or gold, you may consider electroplating.

> Ingrid
> MAL Lab, UIC
--
Winston Chan                     | phone: (319) 353-2398
Dept. of Electrical Engineering  | fax: (319) 353-1115
University of Iowa               | email: [email protected]
Iowa City, IA 52242