Dear Colleagues,
I would like to know of a simple and effective way of removing the edge
bead after spinning of AZ4620 resist on a 3" silicon wafer. At present,
after spinning at 4,000 rpm, a 2-3 microns lip of resist develops around
the rim of the wafer.

Thank You,

(Dr.) Patrick Leech,
CSIRO Division of Manufacturing Science and Technology,
Private Bag 33, Clayton South MDC,
Victoria, Australia, 3169.