Anybody know the information about effects of TMAH on thin metal
films on Si substrate? Especially for cooper films. I plan to etch
through the 650 um si substrate to expose a window of cu film, which
is a up to 30 hours long etching. If the cooper film cannot hold
for such a long time in TMAH, are there any protective layer (such as
photoresist) available for this purpose? Any suggestions will be
deeply appreciated!
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