I want use PECVD nitride layer as a mask for KOH
silicon etching. As far as I know, LPCVD nitride layer
is ordinally used for mask film. How about PECVD
nitride?

Can I use PECVD nitrdie as a mask for KOH silicon
etching like LPCVD nitride?

If you happen to know, could you tell me the etch rate
of PECVD nitride in KOH?

Thank you.



=====
Chang-Hwan Choi
Brown University, Box D
Division of Engineering, 182 Hope Street
Providence, RI 02912, U.S.A.

Tel: (401)867-6017(H), (401)863-2656(O), Fax: (401)863-9028
Email: [email protected], [email protected]

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