Dear MEMS-talk members,

Does anyone know what the ultimate strain or strenght of thin film thermal
silicon dioxide and/or LPCVD silicon nitride is?  I am trying to compare
my analytical model with an accepted value, and having a difficult time
finding an accepted value.  Any help is greatly appreciated.  Thank you in
advance.

Best regards

Dan

Daniel T. Wolters
Mechanical Engineering Graduate Student
MEMS Research Assistant
Department of Mechanical Engineering
111 Church St SE
Minneapolis MN 55455 USA
http://www.me.umn.edu/~wolterdt
work: 612.624.2859
mobile: 651.470.9131