Hi,

    Right now I am going to etch Ag thin film of 30 nm, which is covered
by Cr layer as a mask (can be up to 10 nm). As a result,
1. Is there any feasible approach to do that, including ion bombardment
or any chemical method.
2. Furthermore, can Cr and Ag react to form intermetallic?
3. Usually, how to remove Ag film

 Thanks a lot.

David Yen