Hej MEMS-researcher,
I have to create a stepless sacrificial layer (of any suitable
material like photoresist, ...), which means that the thickness of
the (patterned) layer on a step has not an abrupt rise/fall, but is
going smoothly from the thickness of the layer to zero and vice
versa. The width of this slope should be possible to process between
50 and 100 um; the thickness of the layer as much as possible (up to
10 um or even more). I've heard about "gray-masks", multiexposure
(with stepwise shifted mask). If someone has some
information/experiences about that or any other idea, I'll be
grateful to hear from you.
Thanks and have a nice weekend (relaxing from work...),
Joachim.
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Joachim Oberhammer, Dipl.-Ing.
Royal Institute of Technology (KTH) Phone: +46/(0)8 790 6250
Dep. of Signals, Sensors and Systems Fax: +46/(0)8 10 0858
Microsystem Technology (MST) Mobile: +46/(0)70 692 1858
e-mail: [email protected]
Osquldas vdg 10 homepage: http://www.s3.kth.se/mst/
SE-100 44 Stockholm, Sweden
