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MEMSnet Home: MEMS-Talk: deposition of teflon
deposition of teflon
2001-11-08
Scott Goodwin-Johansson
2001-11-08
Stefan Wiechmann
deposition of teflon
Stefan Wiechmann
2001-11-08
Hi,

we successfully deposited teflon on silica and silicon by plasma enhanced
CVD in a parallel plate reactor (13.56 MHz) using TFE (Tetraflourethylene)
as a gaseous precursor. As expected very poor wettability and therefore not
a perfect adhesion to the substrate (lifts off in acetone after 15 mins in
an ultrasonic bath).

Stefan.

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