looking for method of sharpening single crystal silicon tip
yangzunxian
2001-11-12
Dear all mems members:
I am a doctor in nano-storage ,I have consult many kinds of data about
the sharpening single crystal silicon tip ,all of those belong to the Oxide
sharping ,no others ,can you give me some other means to sharpening the silicon
tip to nano size radii, or give me more detailed and suitable information about
the thermal oxide sharpening of si ,the best ,give me the full text of concerned
paper.please give me a hand, thank you.
sincerely yours
yang
----- Original Message -----
From:
To:
Sent: Tuesday, November 13, 2001 1:01 AM
Subject: mems-talk digest, Vol 1 #91 - 8 msgs
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> Today's Topics:
>
> 1. Chrome plating solution (Vikas Gupta)
> 2. Surface Roughness (Jiangang Du (John Duke))
> 3. AZ 5214E and 5206 Photoresist Application (MKDariel)
> 4. RE: mems-talk digest, Vol 1 #88 - 9 msgs - deposition of teflon (Pancham
R. Patel)
> 5. How to reduce Undercuts for quartz etching? (trammi)
> 6. Material properties of SnO2 ([email protected])
> 7. Re: coating of silicon with aluminium (TEL Klaus Beschorner)
> 8. Re: PZT film (Emilio P. Calius)
>
> --__--__--
>
> Message: 1
> From: Vikas Gupta
> To: [email protected]
> Date: Fri, 9 Nov 2001 16:48:41 -0800 (PST)
> Subject: [mems-talk] Chrome plating solution
>
> Hi all,
>
> I am looking for chrome plating solutions and also the vendors who sell
> them. Any help is appreciated. Thanks in advance.
>
> Vikas Gupta
> Email: [email protected]
>
> --__--__--
>
> Message: 2
> Date: Fri, 9 Nov 2001 22:27:55 -0500
> From: Jiangang Du(John Duke)
> To: "[email protected]"
> Subject: [mems-talk] Surface Roughness
>
> Dear all,
> Can anybody recommend my a method or a instrument that will measure surface
roughness down to 1 anstrom.
> Thanks a lot
>
>
>
>
>
> Regards,
>
> John Duke
>
> --__--__--
>
> Message: 3
> Date: Sat, 10 Nov 2001 22:39:00 +0200
> From: MKDariel
> To: [email protected]
> Subject: [mems-talk] AZ 5214E and 5206 Photoresist Application
>
> Hi,
> I wish to apply these resists to some 3 inch Lithium Niobate wafers. Does
anyone have experience with dehydration bake before resist application? can you
recommend a spinner procedure (time, rpm) that would produce a 1 micron film?
>
> Thanks,
>
> Moti
>
> --__--__--
>
> Message: 4
> Reply-To:
> From: "Pancham R. Patel"
> To:
> Cc:
> Date: Sat, 10 Nov 2001 15:56:15 -0600
> Subject: [mems-talk] RE: mems-talk digest, Vol 1 #88 - 9 msgs - deposition of
teflon
>
> Dear Scott Goodwin-Johansson,
>
> What thicknesses are you looking for?
> If you require films in microns, Dupont sells amorphous fluoropolymers-
> Teflon AF products.
> You will have to use a flurosilane as an adhesion promoter.
> Please do email me back if you want more information or
> you may visit http://www.dupont.com/teflon/af/index.html
>
> Thanks,
> Pancham.
> [email protected]
>
> > From: Scott Goodwin-Johansson
> > To: "'[email protected]'"
> > Date: Thu, 8 Nov 2001 10:30:27 -0500
> > Subject: [mems-talk] deposition of teflon
> > Hi,
> > A colleague of mine has asked me about possible methods for
> > depositing teflon on silicon. If you have any experience or references I
> > would appreciate hearing it. Thanks in advance.
> > Scott
> > [email protected]
>
> --__--__--
>
> Message: 5
> From: "trammi"
> To:
> Reply-To: "trammi"
> Date: Sun, 11 Nov 2001 03:34:37 +0530
> Subject: [mems-talk] How to reduce Undercuts for quartz etching?
>
> Dear all,
>
>
> I'm Ramakrishna working quartz micro machining project. I observed
Undercuts, after etching in BHF at 80C temp, which are quite large(around
300-350 um). Does anyone knows how to reduce these undercuts. i'm using fused
quartz substrate.
>
>
> Thanks in advance.
>
>
> T.Ramakrishna,
>
>
> IITMadras, Chennai. (INDIA)
>
>
>
>
>
>
> Get Your Private, Free E-mail from Indiatimes at http://email.indiatimes.com
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> --__--__--
>
> Message: 6
> Date: Sun, 11 Nov 2001 13:7:19 +0800
> From:
> Reply-To: [email protected]
> To: "[email protected]"
> Subject: [mems-talk] Material properties of SnO2
>
> Dear all,
> Does anybody know the material properties of SnO2 (Tin oxide), such as
Young's modulus,
> thermal conductivity, coefficient of thermal expansion ? I have searched them
on the
> internet but found nothing. Please do me a favour. Thanks in advance.
>
> Zhenchuan Yang
>
> --__--__--
>
> Message: 7
> Date: Sun, 11 Nov 2001 11:58:45 +0100
> From: TEL Klaus Beschorner
> To: [email protected]
> Subject: [mems-talk] Re: coating of silicon with aluminium
>
> What method and process are you using to deposit the Al ?
> 50-80nm is not small, it's miniscule. Under optimal
> conditions, grain diameters in 1um Al films can be
> over 5 um !
>
> Possible reasons for small Al grains:
> 1. contamination (substrate, chamber, materials...)
> 2. substrate bias
>
>
> hope this helps
>
> klaus
>
>
>
> --
>
> (TEEL) Tokyo Electron Europe Limited
> PVD Process Support (ex MRC)
> Klaus Beschorner Tel +49-7033-45683
> Drosselweg 6 Fax +49-7033-45631
> 71120 Grafenau, Germany Mobile +49-174 315 7754
>
> --__--__--
>
> Message: 8
> Date: Mon, 12 Nov 2001 09:41:45 +1300
> From: "Emilio P. Calius"
> Organization: Industrial Research
> To: [email protected]
> Subject: [mems-talk] Re: PZT film
>
> "xinyu li" wrote:
> >
> > Does anybody know the relationship between PZT film thickness and
> > applying voltage and frequency
>
>
> In a conventionally poled PZT, the voltage required for a certain induced
strain
> is directly proportional to the thickness (distance between electrodes) if the
> material properties are constant. And the through-thickness (33) extension and
> shear mode resonant frequencies are both inversely proportional to thickness.
>
> But it seems that the piezoelectric coefficients decrease significantly with
> film thickness. See for example: L. Lian and N.R. Sottos, "Effects of
thickness
> on the piezoelectric and dielectric properties of lead zirconate titanate thin
> films", Journal of Applied Physics, vol. 87, #8, pp. 3941-3949 (April 2000).
> They attribute it to residual stresses.
>
> Good luck, and let us know your results.
>
>
> -----------------------------------------------------------------------
> Dr Emilio P. Calius
> Research Engineer: Smart Materials and Structures
> Industrial Research Limited
> PO Box 2225, Auckland, New Zealand
> Ph: +64 9 303 4116, Fax: +64 9 307 0618
>
>
> --__--__--
>
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> End of mems-talk Digest