Two vertical LPCVD reactors (a Kokusai and a TEL/Varian) in excellent
condition and suitable for MEMS R&D/manufacturing are available. Both
are high throughput, load-locked, cassette-to-cassette units capable of
handling up to 8" wafers. The Kokusai is configured to deposit PolySi
and silicon nitride. The TEL/Varian is configured to deposit tantalum
oxide. Both can readily be used for depositing all standard LPCVD
processes including silica, doped glasses, silicon nitride, PolySi,
titanium silicide, titanium nitride, etc.  All interested MEMS community
parties may contact me for further information.

Fred Jaeger
Affiliated Mgmt, Inc.
Ph (801) 583-7158
Fx (801) 583-7159