Hello,
I am looking for a plasma chemistry for RIE etching E-glass, which is
composed of silicon dioxide, calcium oxide, aluminum oxide, boron oxide,
and trace amounts of sodium, potassium and magnesium oxides. Silicon
dioxide is not a problem to RIE etch. Thanks.
Sincerely,
Robert Dean
Research Associate IV
Center for Advanced Vehicle Electronics
Auburn University
200 Broun Hall
Auburn, AL 36849
Voice: 334-844-1838
Fax: 334-844-1898
Email: [email protected]
