We've worked with silicon nitride and the hydrophilicity isn't as good as with
silicon dioxide.  We have done a rapid thermal oxidation step to grow 20-30 A
of oxide on the surface of the nitride and then treated it with plasma etch and
it seems more effective.  Something to do with the OH groups and humidity, but
no analytical data to support this, just observation.

Helen.

[email protected] wrote:

> Try silcon nitride. I don't believe any modification would be required. Bob
> Henderson
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