Hi all
We are working on fabrication of various MEMS devices.We are facing some
problem regarding how to protect the aluminium layer while doing the silicon
etching in KOH solution. Is there any chemical (just like photoresist) which
can be covered on aluminium layer and also can be patterned so that while
dipping the silicon wafer in KOH solution the chemical layer will not be
attacked by KOH solution and it can be used as protecting layer for underneath
material.
Any suggestions will be highly appreciated.
Bye

Dr. Soumen Das
Sr. Scientific Officer
Microelectronics Centre
Dept. of Electronics & ECE
Indian Institute of Technology
Kharagpur 721 302, India
email: [email protected]
Phone: +91-3222-81914 (O)
            +91-3222-81475 (Lab)
            +91-3222-81915 (R)
Fax: +91-3222-755303/777190