Hi,
What is the Si3N4 film thickness?
Vladimir
Nayna Networks
-----Original Message-----
From: [email protected] [mailto:[email protected]]On
Behalf Of Kyu Tae Yoo
Sent: Wednesday, December 12, 2001 1:05 PM
To: '[email protected]'
Subject: [mems-talk] polyimid/SiN
Hello,
I deposited SiN on fully cured polyimid (@350C) using PECVD at 250.
Polyimid will be removed to release nitride membrane. However,
I found the cracking of the nitride film. Our PECVD nitride film has
fairly low tensile stress ~150Mpa. So, is the cracking due to the CTE
mismatch between SiN and polyimid? Has anyone done similar experiments?
Thanks
____________________________________________________________________
Kyu-Tae Yoo
Ph.D. candidate
Cornell University Phone:530-752-2522(office)
#117 Phillips Hall :530-902-5153(cell)
Computer and Electrical Engineering :530-297-5153(Home)
Ithaca, NY 14853-5401 eFax :509-463-1127
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