Greetings:
Is the following feasible?
1) Mask <100> silicon wafers having aluminum and titanium structures.
2) Etch holes all the way through (300 microns) etching from both sides
using EDP or KOH.
3) Remove the photoresist without disturbing the Ti or Al.  (I worry about
galvanic effects during the stripping due to the presence of Si, Ti, and
Al.)
It is my understanding that well cured SU8 might work as the resist and
SMST-M might work as the stripper.  The following is all I know about the
stripper:
"SMST-M This formulation is the standard formulation. It doesn't attact
metals such as aluminium, gold, titanium, chromium, but a slight attact of
copper and nickel can be observed."

I have contacted the vendor of the stripper, SOTEC MICROSYSTEMS SA, but
often users know more than the vendor.



Roger Brennan
Home:
1403 Forrestal Avenue
San Jose, CA 95110
(408)453-0711 (telephone)
(408)573-9407 (fax)
[email protected]

Work:
Endevco
355 N. Pastoria Ave.
Sunnyvale, CA 94085
408-739-3533 ext 204
[email protected]