Hi,

Maybe you should try electro plating for such thicknesses,

Good luck,

Bruno


At 17:48 16/12/2001 +0200, you wrote:
>Hi All,
>I am trying to deposit 20 microns of Aluminum in Evaporation or in
>Sputtering.
>However, the film is very stress (more stress in sputtering).
>Do you know a way to reduce the stress for such films?
>
>
>My Best Regards,
>Lior Grossman; Sales Manager
>B.G. Technical Support Ltd (www.bg-tech.co.il)
>_______________________________________________
>[email protected] mailing list: to unsubscribe or change your list
>options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
>Hosted by the MEMS Exchange, providers of MEMS processing services.
>Visit us at http://www.mems-exchange.org/
>
***********************************************
*                                             *
*   Dr Bruno Wacogne                          *
*   Laboratoire d'Optique P.M. Duffieux       *
*   Faculti des Sciences et des Techniques    *
*   Route de Gray                             *
*   25030 Besangon cedex                      *
*                                             *
*   tel  (++33) 3 81 66 64 25                 *
*   fax  (++33) 3 81 66 64 23                 *
*   mel  [email protected]         *
*                                             *
* http://imfc.univ-fcomte.fr/lopmd/index.html *
* http://imfc.univ-fcomte.fr/                 *
*                                             *
***********************************************