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MEMSnet Home: MEMS-Talk: KOH Etch Residue
KOH Etch Residue
2001-12-19
Roger Shile
KOH Etch Residue
Roger Shile
2001-12-19
After etching silicon with KOH solution, the etched surfaces are covered with
~0.3 micron globules of some material.

I'm using a thermal SiO2 etch mask.  After KOH etch, I strip the oxide in BOE.
The BOE doesn't seem to remove the contaminate, but results in this material
being broken up into a fine powder-like scum.

Can someone tell me how to remove this material?

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